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Physical and Electrical Analysis of Poly-Si Channel Effect on SONOS Flash Memory

Jun-Kyo Jeong1, Jae-Young Sung1, Woon-San Ko1

  • 1Department of Electronics Engineering, Chungnam National University, Daejeon 305-764, Korea.

Micromachines
|November 27, 2021
PubMed

Keywords:
SONOSatomic force microscope (AFM)data retentiondeuterium annealingflash memorypoly siliconroughnessx-ray photoelectron spectroscopy (XPS)

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