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Multilayer Reflective Coatings for BEUV Lithography: A Review.

Paul C Uzoma1,2, Salman Shabbir1, Huan Hu1

  • 1ZJU-UIUC Institute, International Campus, Zhejiang University, Haining 314400, China.

Nanomaterials (Basel, Switzerland)
|November 27, 2021
PubMed
Summary

Beyond extreme ultraviolet (BEUV) lithography uses periodic multilayer mirrors (PMMs) for advanced microelectronics. This review explores PMM properties, materials, and design for enhanced BEUV lithography performance.

Keywords:
BEUV lithographyX-ray opticsmultilayer mirrorsreflectivity

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Area of Science:

  • Microelectronics Engineering
  • Materials Science
  • Optics and Photonics

Background:

  • Microelectronics advancement relies on shrinking transistors and increasing integration, driving the need for shorter wavelengths in photolithography.
  • Current photolithography uses ultraviolet (UV) and extreme ultraviolet (EUV) radiation; Beyond EUV (BEUV) with ~7 nm wavelengths is the next frontier.
  • BEUV lithography necessitates advanced reflective optics, specifically periodic multilayer mirrors (PMMs), to achieve high reflectivity.

Purpose of the Study:

  • To review the properties and development status of periodic multilayer mirrors (PMMs) for Beyond EUV (BEUV) lithography.
  • To understand the advantages and limitations of PMMs in the context of BEUV lithography systems.
  • To highlight key aspects including materials, design, structure, deposition, and optical characteristics of PMM coatings.

Main Methods:

  • Comprehensive literature review on periodic multilayer mirrors (PMMs) for BEUV lithography.
  • Analysis of PMM properties, including materials, design concepts, and structural characteristics.
  • Evaluation of deposition methods and optical performance of PMM coatings.

Main Results:

  • PMMs function as artificial Bragg crystals with alternating 'light' and 'heavy' material layers, crucial for BEUV optics.
  • Reflectivity of individual mirrors is critical; a 10% increase can yield a six-fold system throughput improvement.
  • The review synthesizes current understanding of PMMs, identifying areas for further development.

Conclusions:

  • PMMs are essential components for enabling BEUV lithography, directly impacting microelectronic manufacturing capabilities.
  • Continued research into PMM materials, design, and fabrication is vital for overcoming limitations and enhancing performance.
  • Optimizing PMM reflectivity is key to improving the overall efficiency and throughput of future BEUV lithography systems.