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High-Sensitivity Infrared Photoelectric Detection Based on WS2 /Si Structure Tuned by Ferroelectrics
Diyuan Zheng1, Xinyuan Dong1, Jing Lu2
1State Key Laboratory of Advanced Optical Communication Systems and Networks, School of Physics and Astronomy, Key Laboratory for Thin Film and Microfabrication Technology of the Ministry of Education Research Institute of Micro/Nano Science and Technology, Shanghai Jiao Tong University, 800 Dongchuan Road, Shanghai, 200240, P. R. China.
Abstract:
As one of the typical transition-metal dichalcogenides with distinct optical and electrical properties, WS2 exhibits tremendous potential for optoelectronic devices. However, its inherent band gap range limits the application in the infrared region. To overcome this draw-back and improve the sensitivity, P(VDF-CTFE) is used as a ferroelectric gate to control the states of WS2 /Si junctions and achieve an enhanced infrared photodetection. The polarization electric field not only broadens the range of absorption wavelength (405-1550 nm) but also greatly promotes the sensitivity of lateral photovoltaic effect (LPE) (from 198.6 to 503.2 mV mm-1 ). This phenomenon is attributed to the reduction of WS2 band gap and the change of potential barrier at the interface of the junction. Meanwhile, the response speed is improved significantly due to the increase of carrier initial kinetic energy. This new scheme for ferroelectric tuned LPE opens up a way to realize high-sensitivity, ultrafast, and stable infrared photodetection.
