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Updated: Oct 6, 2025
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Focused Ion Beam Fabrication of LiPON-based Solid-state Lithium-ion Nanobatteries for In Situ Testing
Published on: March 7, 2018
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Nanoscale Li, Na, and K ion-conducting polyphosphazenes by atomic layer deposition
R Blake Nuwayhid1, Daniela Fontecha1, Alexander C Kozen1
1Department of Materials Science and Engineering, University of Maryland, College Park, MD 20742, USA. kgregorc@umd.edu.
Dalton Transactions (Cambridge, England : 2003)
|January 20, 2022
Summary
Lithium, sodium, and potassium phosphorous oxynitride (LiPON, NaPON, KPON) thin films were developed using atomic layer deposition (ALD). While LiPON and NaPON share similar mechanisms, KPON exhibits a distinct structure and reaction pathway, highlighting ALD
Area of Science:
- Materials Science
- Electrochemistry
- Chemical Engineering
Background:
- Lithium phosphorous oxynitride (LiPON) is a key thin-film solid-state electrolyte.
- Recent progress in thin-film ion conductors builds upon LiPON's success.
- Atomic Layer Deposition (ALD) enables precise control over thin-film properties.
Purpose of the Study:
- To compare ALD processes for LiPON, NaPON, and a novel potassium phosphorous oxynitride (KPON).
- To elucidate the reaction mechanisms governing the formation of alkali phosphorous oxynitride (APON) films.
- To assess the structural and electrochemical properties of APON thin films.
Main Methods:
- Comparative analysis of published LiPON and NaPON ALD processes with a new KPON ALD process.
- Utilized alkali tert-butoxides and diethylphosphoramidate as precursors for all APON films.
- Employed in-operando mass spectrometry to determine ALD surface reaction mechanisms, particularly for LiPON.
Main Results:
- NaPON and LiPON exhibit similar ALD reaction mechanisms and structural characteristics.
- KPON, despite similar ALD parameters, shows significantly less nitrogen incorporation, resembling a phosphate glass.
- The distinct structure of KPON suggests a different underlying reaction mechanism compared to LiPON and NaPON.
Conclusions:
- ALD is a versatile technique for developing novel thin-film ion conductors.
- Understanding reaction mechanisms is crucial for tailoring APON film properties.
- KPON's unique characteristics necessitate further investigation into its formation and properties.
