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Dependence of Interfacial Adhesion between Substances on Their Electron Work Functions
Raymond Christopher Setiawan1, Mingyu Wu1, D Y Li1
1Department of Chemical and Materials Engineering, University of Alberta, Edmonton AB T6G 2H5, Canada.
Langmuir : the ACS Journal of Surfaces and Colloids
|January 25, 2022
Summary
The adhesive force between materials increases with the difference in their electron work functions (EWF). This study quantifies adhesion without atomic diffusion, offering insights into material interactions.
Area of Science:
- Materials Science
- Surface Science
- Tribology
Background:
- Understanding adhesive forces is crucial for material design and performance.
- Atomic diffusion can complicate the measurement of intrinsic adhesive properties.
- Electron work function (EWF) is a key electronic property influencing surface interactions.
Purpose of the Study:
- To demonstrate the relationship between adhesive force and electron work function differences.
- To investigate adhesion between silicon nitride (Si3N4) and various metals.
- To develop an analytical model for quantifying adhesive interactions.
Main Methods:
- Utilized atomic force microscopy (AFM) to measure adhesive forces.
- Employed a range of metals in contact with Si3N4.
- Analyzed the influence of electron freedom and density on adhesion.
Main Results:
- Adhesive force (FAd) was found to increase with larger differences in electron work function (φ) between contacting substances.
- Adhesion was observed to be influenced by electron availability and density.
- No atomic diffusion was involved in the observed adhesive forces.
Conclusions:
- The study establishes a direct correlation between EWF differences and adhesive forces.
- An analytical model was proposed to explain and quantify the observed adhesive phenomena.
- Findings provide a foundation for predicting and controlling adhesion in material interfaces.
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