Hydrogen Plasma-Based Medium Pressure Chemical Ionization Source for GC-TOFMS

The construction, critical evaluation, and performance assessment of a medium-pressure (2-13 mbar), high-temperature chemical ionization (CI) source for application in GC-MS is described. The ion source is coupled to a commercial time-of-flight (TOF) mass analyzer. Reagent ions are generated in a two staged process. The first stage uses a filament free, helical resonator plasma (HRP) driven ion source for H₃⁺ generation. Reagent gases, for example, nitrogen, isobutane, and methane are added in a second stage to the H₃⁺ stream, which leads to the formation of final protonation reagents. The GC effluent is added subsequently to the reagent ion gas stream. Designed for the hyphenation with gas chromatography, this GC-CI-TOFMS combination produces GC limited Gaussian peak shapes even for high boiling point compounds. Limits of detection for the compounds investigated are determined as 0.4-1.2 pg on column with nitrogen, 0.6-12.6 pg with isobutane, and 2 pg to >25 pg with methane as reagent gas, respectively. An EPA 8270 LCS mix containing 78 main EPA pollutants is used to evaluate the selectivity of the different reagent ions. Using nitrogen as reagent gas, 74 of 78 compounds are detected. In comparison, 41 of 78 compounds and 62 of 78 compounds are detected with isobutane or methane as CI reagent gas, respectively.