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    Optimizing diffraction efficiency in digital micromirror devices (DMDs) significantly boosts laser energy use for photolithography. This study enhances DMD diffraction efficiency, increasing laser energy utilization for improved throughput.

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    Area of Science:

    • Optics and Photonics
    • Materials Science
    • Nanotechnology

    Background:

    • Photolithography throughput relies heavily on laser energy utilization.
    • Digital Micromirror Device (DMD) diffraction efficiency is critical for energy utilization.
    • Optimizing diffraction efficiency is key to advancing projection photolithography.

    Purpose of the Study:

    • To optimize DMD diffraction efficiency for enhanced laser energy utilization.
    • To investigate the impact of pitch size and wavelength on diffraction efficiency.
    • To validate an optimization model for projection lithography systems.

    Main Methods:

    • Calculated diffraction efficiencies using two-dimensional blazed grating theory.
    • Optimized light incident angle for specific DMD pitch size and laser wavelength.
    • Experimentally verified effective energy utilization in a lithography illumination system.

    Main Results:

    • Achieved a maximum single-order diffraction efficiency increase from 40% to 96% for a 7.56 μm pitch-size DMD at 343 nm.
    • Optimized effective energy utilization up to 88% at a 34° angle of incidence.
    • Experimental results aligned with theoretical calculations, confirming the model's validity.

    Conclusions:

    • The developed optimization model effectively improves energy utilization in projection lithography.
    • The model is applicable to various wavelengths and DMD pitch sizes.
    • Enhanced diffraction efficiency leads to significant improvements in laser energy utilization and lithography throughput.