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Related Experiment Video

Updated: Oct 2, 2025

The Generation of Higher-order Laguerre-Gauss Optical Beams for High-precision Interferometry
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Generative-adversarial-network-based dimensional measurement of optical waveguides.

Masashi Ota, Keita Yamaguchi, Kenya Suzuki

    Optics Express
    |February 25, 2022
    PubMed
    Summary

    We developed a precise waveguide measurement method using a generative adversarial network (GAN) and optical microscopy. This approach achieves high throughput and accuracy, comparable to super-resolution imaging.

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    Area of Science:

    • Optical Engineering
    • Materials Science
    • Artificial Intelligence

    Background:

    • Accurate measurement of waveguide dimensions is critical for photonic device performance.
    • Traditional methods can be time-consuming or lack the required precision.
    • Integrating artificial intelligence with optical microscopy offers potential for enhanced metrology.

    Purpose of the Study:

    • To propose a high-throughput and precise method for measuring waveguide dimensions.
    • To leverage a generative adversarial network (GAN) for image analysis.
    • To validate the accuracy of the proposed measurement technique.

    Main Methods:

    • A novel method combining a generative adversarial network (GAN) with a curve-fitting calculator using sidewall functions.
    • Acquisition of low-magnification (LM) and high-magnification (HM) optical microscope images of waveguides at 500× and 2000×, respectively.
    • Training the GAN to learn discrepancies between LM and HM images for dimensional analysis.

    Main Results:

    • Achieved a standard deviation of waveguide widths of approximately 0.8 pixels (∼ 42 nm).
    • Demonstrated precise width measurement capabilities.
    • Confirmed that the method provides precise measurements at the same imaging throughput as LM microscopy.

    Conclusions:

    • The proposed GAN-based method offers a high-throughput and precise solution for waveguide dimensional measurement.
    • This technique integrates advanced AI with optical microscopy for improved metrology.
    • The results show potential for enhanced quality control and device optimization in integrated photonics.