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A synchrotron-based kilowatt-level radiation source for EUV lithography.

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A compact damping ring can generate high-power coherent extreme ultraviolet (EUV) radiation. This technology utilizes laser-induced micro-bunching for efficient EUV production.

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Area of Science:

  • Physics
  • Accelerator Science
  • Laser Technology

Background:

  • Producing high-power coherent extreme ultraviolet (EUV) radiation is crucial for various scientific and industrial applications.
  • Existing methods for EUV generation often require large-scale facilities or suffer from limitations in power and coherence.

Purpose of the Study:

  • To propose a compact damping ring design for generating kilowatt-level coherent EUV radiation.
  • To demonstrate the feasibility of achieving high-power EUV radiation using advanced accelerator and laser technologies.

Main Methods:

  • A compact damping ring with a circumference of approximately 160 m is designed.
  • An angular-dispersion-induced micro-bunching method is employed to modulate electron bunches.
  • A 257 nm wavelength seed laser is used in conjunction with the micro-bunching technique.

Main Results:

  • Coherent radiation at 13.5 nm is achieved.
  • An average power of approximately 2.5 kW is obtained.
  • The proposed method leverages state-of-the-art accelerator and laser technologies.

Conclusions:

  • The proposed compact damping ring is a viable solution for generating high-power coherent EUV radiation.
  • The integration of laser-induced micro-bunching offers an efficient pathway to advanced EUV sources.
  • This technology has the potential to advance fields requiring high-brightness EUV light sources.