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Phase-shifting algorithms with known and unknown phase shifts: comparison and hybrid
Optics Express
|March 18, 2022
Summary
This study comprehensively evaluates unknown phase-shifting algorithms (uPSAs) for precision measurement, comparing them with known phase-shifting algorithms (kPSAs). Results highlight uPSA performance and introduce a hybrid algorithm for enhanced accuracy.
Area of Science:
- Optical metrology
- Interferometry
- Precision measurement
Background:
- Phase-shifting interferometry (PSI) is crucial for precision measurements, requiring robust phase-shifting algorithms (PSAs) to mitigate errors like phase-shift inaccuracies, intensity harmonics, and noise.
- Existing research extensively covers known phase-shifting algorithms (kPSAs) but lacks thorough evaluation of unknown phase-shifting algorithms (uPSAs), leaving their prerequisites and performance unclear.
Purpose of the Study:
- To comprehensively evaluate the prerequisites and performance of four representative uPSAs.
- To compare the performance of uPSAs against twelve benchmarking kPSAs.
- To clarify the selection criteria for kPSAs and showcase the potential of uPSAs.
Main Methods:
- Evaluation of four uPSAs: advanced iterative algorithm, general iterative algorithm (GIA), principal component analysis-based algorithm, and VU factorization-based algorithm.
- Comparative analysis of uPSAs against twelve established kPSAs.
- Development of a hybrid kPSA-GIA algorithm.
Main Results:
- Identified limitations and performance characteristics of different uPSAs.
- Demonstrated the need for careful kPSA selection and highlighted the attractive performance and fewer restrictions of uPSAs.
- The general iterative algorithm (GIA) showed outstanding performance.
Conclusions:
- uPSAs offer significant advantages in precision measurement, with the GIA being particularly effective.
- A novel hybrid kPSA-GIA algorithm is proposed to enhance kPSA performance and overcome GIA's fringe density limitations.
- This work provides a clearer understanding of PSA selection for demanding metrology applications.
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