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Design and Control of Pressure-Swing Heat Integration Distillation for the Trichlorosilane Purification Process.

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Area of Science:

  • Chemical Engineering
  • Process Optimization
  • Separation Technology

Background:

  • Trichlorosilane (TCS) is vital for polysilicon production.
  • TCS purification is energy-intensive, necessitating process improvements.

Purpose of the Study:

  • Investigate the design and control of a TCS heat integration pressure-swing distillation (HIPSD) process.
  • Evaluate the economic and control performance of HIPSD compared to conventional distillation.

Main Methods:

  • Utilized Aspen Plus V8.4 and Aspen Dynamics for process simulation and dynamic analysis.
  • Configured three partial and one full HIPSD process variations.
  • Implemented feedforward control structures (QR/F and FREC/F) for robust process management.

Main Results:

  • Partial and full HIPSD reduced total annual costs by 15.75% and 27.39%, respectively.
  • The full HIPSD scheme effectively handled ±10% feed disturbances (flow and composition).
  • Integral squared error and dynamic response curves confirmed the superior performance of the full HIPSD control strategy.

Conclusions:

  • The developed HIPSD process offers significant energy and cost savings for TCS purification.
  • The proposed control strategy ensures robust operation and economic benefits in polysilicon manufacturing.
  • This research provides valuable insights for distillation process and control design in the polysilicon industry.