F, N neutralizing effect induced Co-P-O cleaving endows CoP nanosheets with superior HER and OER performances

Dexin Xu1, Jing Yao1, Xinzhi Ma1

  • 1School of Physics and Electronic Engineering, Key Laboratory for Photonic and Electronic Bandgap Materials, Ministry of Education, Harbin Normal University, Harbin 150025, Heilongjiang, China.