Plasmon-Phonon Coupling in Electrostatically Gated β-Ga2O3 Films with Mobility Exceeding 200 cm2 V-1 s-1

Anil Kumar Rajapitamahuni1, Anusha Kamath Manjeshwar1, Avinash Kumar2

  • 1Department of Chemical Engineering and Materials Science, University of Minnesota, Minneapolis, Minnesota 55455, United States.

ACS Nano
|April 18, 2022
PubMed
Summary

Electrostatic doping of Gallium Oxide (Ga2O3) films enabled tunable carrier densities. This study reveals plasmon-phonon coupling significantly impacts electron mobility in Ga2O3, offering insights for device enhancement.

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