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Plasmon-Phonon Coupling in Electrostatically Gated β-Ga2O3 Films with Mobility Exceeding 200 cm2 V-1 s-1
Anil Kumar Rajapitamahuni1, Anusha Kamath Manjeshwar1, Avinash Kumar2
1Department of Chemical Engineering and Materials Science, University of Minnesota, Minneapolis, Minnesota 55455, United States.
Electrostatic doping of Gallium Oxide (Ga2O3) films enabled tunable carrier densities. This study reveals plasmon-phonon coupling significantly impacts electron mobility in Ga2O3, offering insights for device enhancement.
Area of Science:
- Materials Science
- Condensed Matter Physics
- Semiconductor Physics
Background:
- Monoclinic β-Ga2O3 is an ultra-wide bandgap semiconductor with significant research interest.
- Fundamental studies of plasmon-phonon coupling in β-Ga2O3 are hindered by difficulties in achieving high carrier densities without chemical disorder.
Purpose of the Study:
- To investigate the impact of plasmon-phonon coupling on electron transport properties in β-Ga2O3.
- To achieve tunable carrier densities in β-Ga2O3 films via electrostatic doping.
- To understand the dynamic screening effects influencing electron mobility.
Main Methods:
- Fabrication of ion-gel-gated electric double-layer transistors for β-Ga2O3 films.
- Temperature-dependent Hall effect measurements.
- Transport modeling and ab initio calculations of electron-phonon scattering rates.
Main Results:
- Achieved highly reversible, electrostatic doping of β-Ga2O3 with tunable carrier densities.
- Observed a peak room-temperature mobility of 201 cm² V⁻¹ s⁻¹, followed by a decrease with increasing carrier density due to plasmon-phonon coupling.
- Identified an "antiscreening" effect arising from dynamic screening by hybrid plasmon-phonon modes.
Conclusions:
- Plasmon-phonon coupling significantly influences electron mobility in β-Ga2O3, exhibiting an antiscreening effect.
- Higher room-temperature mobility (up to 300 cm² V⁻¹ s⁻¹) is theoretically possible at high electron densities (>10²⁰ cm⁻³).
- Understanding plasmon-phonon coupling is crucial for enhancing mobility in Ga2O3 and other polar semiconductors for device applications.
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