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Electron beam lithography for direct patterning of MoS2 on PDMS substrates
Gil Jumbert1,2, Marcel Placidi3,4, Francesc Alzina1
1Catalan Institute of Nanoscience and Nanotechnology (ICN2), CSIC, BIST, Campus UAB Bellaterra 08193 Barcelona Spain marianna.sledzinska@icn2.cat.
RSC Advances
|April 28, 2022
Summary
This study introduces a novel electron beam lithography (EBL) method for patterning 2D materials like molybdenum disulfide (MoS2) on polydimethylsiloxane (PDMS) substrates. The technique simplifies fabrication and produces residue-free microstructures on flexible or rigid surfaces.
Area of Science:
- Materials Science
- Nanotechnology
- Surface Science
Background:
- Precise patterning of 2D materials into micro- and nanostructures is challenging.
- Standard lithography methods are complex and may leave residues.
Purpose of the Study:
- To develop an alternative fabrication technique for 2D materials.
- To simplify the patterning process of MoS2 on PDMS substrates.
Main Methods:
- Direct electron beam lithography (EBL) on MoS2/PDMS.
- Optimization of EBL acceleration voltages and doses.
- Utilizing PDMS cross-linking and shrinking induced by electron beam interaction.
Main Results:
- Fabrication of well-defined MoS2 microstructures.
- Enhanced adhesion of MoS2 to PDMS in exposed regions.
- Successful transfer of microstructures to flexible or rigid substrates.
Conclusions:
- The EBL method offers a simplified, faster, and residue-free approach for 2D material patterning.
- This technique is suitable for creating microstructures on various substrates.
- The process avoids the need for additional polymers like PMMA or photoresists.
