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Updated: Sep 25, 2025

Monolayer Contact Doping of Silicon Surfaces and Nanowires Using Organophosphorus Compounds
Published on: December 2, 2013
Bandgap recovery of monolayer MoS2 using defect engineering and chemical doping
Frederick Aryeetey1, Sajedeh Pourianejad2, Olubukola Ayanbajo1
1Department of Nanoengineering, North Carolina A&T State University 2907 East Gate City Blvd Greensboro NC 27401 USA saravamu@ncat.edu +1-336-500-0115 +1-336-285-2810.
Abstract:
Two-dimensional transition metal dichalcogenide materials have created avenues for exciting physics with unique electronic and photonic applications. Among these materials, molybdenum disulfide is the most known due to extensive research in understanding its electronic and optical properties. In this paper, we report on the successful growth and modification of monolayer MoS2 (1L MoS2) by controlling carrier concentration and manipulating bandgap in order to improve the efficiency of light emission. Atomic size MoS2 vacancies were created using a Helium Ion Microscope, then the defect sites were doped with 2,3,5,6-tetrafluro7,7,8,8-tetracyanoquinodimethane (F4TCNQ). The carrier concentration in intrinsic (as-grown) and engineered 1L MoS2 was calculated using Mass Action model. The results are in a good agreement with Raman and photoluminescence spectroscopy as well as Kelvin probe force microscopy characterizations.
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