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Cross-Project Defect Prediction Based on Two-Phase Feature Importance Amplification.

Ying Xing1, Wanting Lin1, Xueyan Lin1

  • 1School of Artificial Intelligence, Beijing University of Posts and Telecommunications, 100876 Beijing, China.

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Summary
This summary is machine-generated.

This study introduces a two-phase feature importance amplification (TFIA) model to improve cross-project defect prediction (CPDP). TFIA effectively addresses data distribution differences and class imbalance, enhancing defect prediction accuracy in software engineering.

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Area of Science:

  • Software Engineering
  • Computational Intelligence
  • Machine Learning

Background:

  • Cross-project defect prediction (CPDP) leverages data from source projects to predict defects in target projects.
  • CPDP faces challenges due to class imbalance and differing data distributions across projects.
  • Accurate defect prediction is crucial for efficient software testing and quality assurance.

Purpose of the Study:

  • To propose a novel Two-Phase Feature Importance Amplification (TFIA) model for CPDP.
  • To address the key challenges of class imbalance and data distribution heterogeneity in CPDP.
  • To enhance the accuracy and efficiency of defect prediction models in software engineering.

Main Methods:

  • A two-phase approach involving domain adaptation and classification.
  • Domain adaptation phase: Reduces data distribution differences via project filtering and correlation-based feature selection (greedy best-first search).
  • Classification phase: Employs Random Forest to amplify feature importance and build a sensitive prediction model.

Main Results:

  • The TFIA model demonstrated significant improvements in CPDP performance.
  • Ablation and comparison experiments on the AEEEM database validated the model's effectiveness.
  • The TFIA CPDP model exhibited stable and efficient performance across experiments.

Conclusions:

  • The proposed TFIA model effectively mitigates challenges in CPDP.
  • TFIA offers a robust solution for improving defect prediction accuracy.
  • The model's stability and efficiency provide a strong basis for practical application in software engineering.