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Updated: Sep 24, 2025

Fabrication of Gate-tunable Graphene Devices for Scanning Tunneling Microscopy Studies with Coulomb Impurities
Published on: July 24, 2015
Effect of interfacial defects on the electronic properties of graphene/g-GaN heterostructures
Zhongxun Deng1, Xianhui Wang1, Jie Cui1
1Shanxi Province Key Laboratory of Electrical Materials and Infiltration Technology, School of Materials Science and Engineering, Xi'an University of Technology Xi'an 710048 Shaanxi P. R. China xhwang693@xaut.edu.cn.
Abstract:
To gain deep insights into their interactions, the effects of interfacial defects on the structural and electronic properties of graphene/g-GaN heterostructures were investigated by using first-principles calculations. The graphene/g-GaN-VGa heterostructure maintains a p-type Schottky contact in the spin-up channel and the Schottky barrier height (SBH) is decreased to 0.332 eV, but there is not a metal/semiconductor contact in the spin-down channel. However, the n-type SBH is negative for the graphene/g-GaN-VN heterostructure, indicating an ohmic contact. Furthermore, the SBH in the graphene/g-GaN heterostructure can be effectively modulated by the interlayer distance. The research could provide a strategy for the development and fabrication of efficient novel nanoelectronic devices.
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