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Updated: Sep 23, 2025
Atomic Force Microscopy Cantilever-Based Nanoindentation: Mechanical Property Measurements at the Nanoscale in Air and Fluid
Published on: December 2, 2022
Morphology and mechanical behavior of diamond films fabricated by IH-MPCVD
Rong Tu1, Tiantian Xu1, Dengfeng Li1
1State Key Laboratory of Advanced Technology for Materials Synthesis and Processing, Wuhan University of Technology 122 Luoshi Road Wuhan 430070 People's Republic of China kobe@whut.edu.cn superkobe0104@gmail.com.
Abstract:
Morphology of diamond films has been controlled via intermediate frequency induction heated microwave plasma chemical vapor deposition (IH-MPCVD), which was transformed with various substrate temperatures (T sub = 923-1123 K) and CH4/H2 ratios (η c = 0.5-2 vol%). The coupling effects of T sub and η c on the structure of diamond films have been studied. At η c = 0.5 vol%, the sp3/sp2 ratio of diamond films reached 98% at 1073 K, surface roughness (R ms) increased from 50 to 85 nm with increasing T sub, the maximum hardness (H a) reached 84 GPa at 973 K, and the maximum Young's modulus (E) reached 642 GPa at 1023 K. The residual stress (σ) was calculated as a function of T sub and η c. The quality factor (Q), combining microstructure and mechanical behavior, has been creatively defined to evaluate the quality of diamond films.
