MOSFET: Enhancement Mode
MOSFET Amplifiers
Biasing of Metal-Semiconductor Junctions
Biasing of P-N Junction
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Preparation of Large-area Vertical 2D Crystal Hetero-structures Through the Sulfurization of Transition Metal Films for Device Fabrication
Published on: November 28, 2017
Hailiang Liu1,2, Sajjad Hussain1,2, Asif Ali1,2
1Graphene Research Institute, Sejong University Seoul 143-747 Republic of Korea jwjung@sejong.ac.kr.
This study corrects a previously published article DOI. The correction ensures accurate referencing for scientific literature and research integrity.
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