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Application of a Coupling Agent to Improve the Dielectric Properties of Polymer-Based Nanocomposites
Published on: September 19, 2020
Toughening of POSS-MPS composites with low dielectric constant prepared with structure controllable micro/mesoporous
Jian Jiao1, Yudi Shao1, Fenchao Huang1
1Department of Applied Chemistry, School of Science, Northwestern Polytechnical University Xi' an 710072 P. R. China jjiao@nwpu.edu.cn.
Abstract:
In this work, we developed a modified calcination and extraction method to obtain controllable micro/mesoporous nanoparticle samples POSS-MPS, which were synthesized through glycidyl polyhedral oligomeric silsesquioxane (G-POSS) grafting with aminopropyl-functionalized mesoporous silica (AP-MPS). The POSS-MPS was introduced into the cyanate ester (CE) matrix to optimize the dielectric properties and enhance the toughness of the POSS-MPS/CE nanocomposite. The structure of the hybrid was characterized by FTIR and SEM. The dispersion properties, mechanical properties, dielectric properties and thermal performance were also studied. The results showed that both the C-POSS-MPS and E-POSS-MPS uniformly distribute in the CE matrix with the content of 0.5-4 wt%. The impact strength increased 52% and 60% separately with 2 wt% C-POSS-MPS and E-POSS-MPS addition respectively. The introduction of E-POSS-MPS particles can significantly decrease the dielectric loss value of the POSS-MPS/CE composites to 0.00498, which is of potential in wave transparent composites and structures.

