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Plasma-assisted Molecular Beam Epitaxy of N-polar InAlN-barrier High-electron-mobility Transistors
Published on: November 24, 2016
Ningping Shi1, Kejia Wang2, Bing Zhou1,3
1School of Materials Science and Engineering, Key Laboratory of New Processing Technology for Nonferrous Metals and Materials of Ministry of Education, Collaborative Innovation Center for Exploration of Nonferrous Metal Deposits and Efficient Utilization of Resources, Guilin University of Technology, Guilin 541004, China.
Optimizing Aluminum Gallium Nitride/Gallium Nitride High Electron Mobility Transistors (AlGaN/GaN HEMTs) using a gate-source composite field plate (SG-FP) significantly boosts breakdown voltage and figure of merit (FOM). This enhancement improves overall device performance for wider applications.
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