Antimicrobial second skin using copper nanomesh

Jae Joon Kim1, Siyoung Ha2, Lina Kim2

  • 1Department of Electrical Engineering and Information Systems, The University of Tokyo, Bunkyo-Ku, Tokyo 113-8656, Japan.

Summary

A novel copper nanomesh platform effectively prevents pathogen cross-infection on skin. This antimicrobial material maintains skin