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Antiferromagnetic ordering in the TM-adsorbed AlN monolayer (TM = V and Cr)
Duy Khanh Nguyen1, Tuan V Vu2,3, D M Hoat4,5
1High-Performance Computing Lab (HPC Lab), Information Technology Center, Thu Dau Mot University, Binh Duong Province Vietnam.
Abstract:
In this work, the effects of transition metal (TM = V and Cr) adsorption on AlN monolayer electronic and magnetic properties are investigated using first-principles density functional theory (DFT) calculations. TMs prefer to be adsorbed on-top of a bridge position as indicated by the calculated adsorption energy. V adatoms induce half-metallicity, while Cr adatoms metallize the monolayer. The magnetic properties are produced mainly by the V and Cr adatoms with magnetic moments of 3.72 and 4.53 μ B, respectively. Further investigation indicates that antiferromagnetic (AFM) ordering is energetically more favorable than ferromagnetic (FM) ordering. In both cases, the AFM state is stabilized upon increasing adatom coverage. The AlN monolayer becomes an AFM semiconductor with 0.5 ML of V adatom, and metallic nature is induced with 1.0 ML. Meanwhile, the degree of metallicity increases with increasing Cr adatoms. Results reported herein may provide a feasible new approach to functionalize AlN monolayers for spintronic applications.
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