Related Experiment Video
Updated: Sep 6, 2025
A Continuous-flow Photocatalytic Reactor for the Precisely Controlled Deposition of Metallic Nanoparticles
Published on: April 10, 2019
Protocol on irradiation-dark photochemical deposition and characterization of metal nanoclusters on semiconductor
Haocheng Wu1, Yi Zhu1, Rongrong Jia1
1Research Center of Nano Science and Technology, College of Sciences, Shanghai University, Shanghai 200444, P. R. China.
Abstract:
Controlling the size and uniform dispersion of noble metal nanoclusters on the metal oxide based semiconductor are difficult due to the natural tendency for metal atoms to agglomerate. Here, we present the protocol for an "irradiation-dark" photochemical deposition to obtain uniform metal nanoclusters on semiconductor support, and the protocol for measuring the size and size distribution of metal nanoclusters. For complete details on the use and execution of this protocol, please refer to Wu et al. (2022).
