Patterning submicron photomechanical features into single diarylethene crystals using electron beam lithography

Wangxiang Li1, Daichi Kitagawa2, Seiya Kobatake2

  • 1Department of Chemistry, University of California, Riverside, 501 Big Springs Road, Riverside, CA, 92521, USA. christopher.bardeen@ucr.edu.

Nanoscale Horizons
|July 5, 2022
PubMed
Summary

Electron beam lithography (EBL) successfully patterned organic photomechanical crystals. Light exposure induced reversible, amplified height changes in nanoscale features, enabling new light-powered actuators.

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