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Single-Digit Nanometer Electron-Beam Lithography with an Aberration-Corrected Scanning Transmission Electron Microscope
Published on: September 14, 2018
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Patterning submicron photomechanical features into single diarylethene crystals using electron beam lithography
Wangxiang Li1, Daichi Kitagawa2, Seiya Kobatake2
1Department of Chemistry, University of California, Riverside, 501 Big Springs Road, Riverside, CA, 92521, USA. christopher.bardeen@ucr.edu.
Nanoscale Horizons
|July 5, 2022
Summary
Electron beam lithography (EBL) successfully patterned organic photomechanical crystals. Light exposure induced reversible, amplified height changes in nanoscale features, enabling new light-powered actuators.
Area of Science:
- Materials Science
- Organic Electronics
- Nanotechnology
Background:
- Lithography is crucial for inorganic semiconductors but underutilized for organic crystals.
- Organic photomechanical crystals offer unique light-responsive properties.
- Developing methods to pattern these crystals is essential for advanced applications.
Purpose of the Study:
- To apply electron beam lithography (EBL) for patterning single organic photomechanical crystals.
- To investigate the photomechanical response of EBL-defined structures.
- To explore the potential of these patterned crystals in light-powered actuators.
Main Methods:
- Electron beam lithography (EBL) was used to create amorphous patterns on organic crystals.
- A removable gold coating protected unexposed crystal regions.
- Photomechanical response was studied using 365 nm light and visible light for reversal.
Main Results:
- EBL successfully patterned sub-micron structures into organic photomechanical crystals.
- Light exposure caused reversible height increases (30-70%) in amorphous ridges.
- Patterned features exhibited amplified dimensional changes compared to the bulk crystal.
- Reversible morphological changes were strong enough to rupture graphene sheets.
Conclusions:
- EBL is a viable technique for microstructuring organic photomechanical crystals.
- Nanoscale patterning amplifies photomechanical effects, enabling light-driven actuation.
- This work opens new avenues for creating monolithic, light-powered devices.

