Related Experiment Video
Updated: Sep 5, 2025

Atomic Layer Deposition of Vanadium Dioxide and a Temperature-dependent Optical Model
Published on: May 23, 2018
Thermal Annealing Effects of V2O5 Thin Film as an Ionic Storage Layer for Electrochromic Application
Tien-Chai Lin1, Bai-Jhong Jheng1, Hui-Min Yen2
1Department of Electrical Engineering, Kun Shan University, Yongkang, Tainan 710303, Taiwan.
Abstract:
A vanadium pentoxide (V2O5) thin film with thermal annealing as an ionic storage layer for electrochromic devices is presented in our study. The V2O5 thin film was deposited on an ITO glass substrate by an RF magnetron sputtering. The electrochromic properties of the film were evaluated after various thermal annealing temperatures. The structural analysis of the film was observed by X-ray diffraction (XRD), field emission electron microscopy (FE-SEM), and atomic force microscopy (AFM). The structure of the V2O5 thin film transformed from an amorphous to polycrystalline structure with directions of (110) and (020) after 400 °C thermal annealing. The electrochromic properties of the film improved compared with the unannealed V2O5 thin film. We obtained a charge capacity of 97.9 mC/cm2 with a transparent difference ΔT value of 31% and coloration efficiency of 6.3 cm2/C after 400 °C thermal annealing. The improvement was due to the polycrystalline orthorhombic structure formation of V2O5 film by the rearrangement of atoms from thermal energy. Its laminate structure facilitates Li+ ion intercalation and increases charge capacity and transparent difference.

