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Recent Progress on Optical Tomographic Technology for Measurements and Inspections of Film Structures
13D Optical Metrology Laboratory, Department of Photonic Engineering, Chosun University, 309 Pilmun-daero, Dong-gu, Gwangju 61452, Korea.
Micromachines
|July 27, 2022
Summary
This review covers advanced film metrology technologies and measurement schemes from the past 20 years. It explores optical techniques, their principles, and future trends in film measurement.
Area of Science:
- Materials Science
- Optical Engineering
- Metrology
Background:
- Film metrology is crucial for characterizing thin films in various advanced applications.
- Understanding film properties requires sophisticated measurement technologies.
Purpose of the Study:
- To review recent progress in film metrology over the last two decades.
- To explore advanced and novel technologies and their measurement schemes.
Main Methods:
- Review of optical techniques used in film metrology.
- Analysis of temporal, spatial, and snapshot measurement schemes.
- Discussion of technology trends and prospects.
Main Results:
- Introduction of various optical techniques with their benefits and limitations.
- Description of different measurement schemes (temporal, spatial, snapshot).
Conclusions:
- Optical film metrology has seen significant advancements in the last 20 years.
- Future prospects are discussed in relation to emerging technology trends.
