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W-Band 4th Order Waveguide Filter Based on Double Layer SU8 Microfabrication.

Min Liu1, Qian Yang1, Anxue Zhang1

  • 1School of Information and Communications Engineering, Xi'an Jiaotong University, Xi'an 710049, China.

Sensors (Basel, Switzerland)
|July 28, 2022
PubMed
Summary

This study details the precise fabrication of W-band waveguide bandpass filters using SU-8 photoresist. Achieved manufacturing tolerances and performance metrics confirm the viability of SU-8 micromachining for high-frequency devices.

Keywords:
SU-8 photoresistW-bandcylindrical resonatorsmicrofabricationmillimeter wavewaveguide filter

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Area of Science:

  • Microwave Engineering
  • Materials Science
  • Nanofabrication

Background:

  • SU-8 photoresist is a versatile material for microelectromechanical systems (MEMS) fabrication.
  • Waveguide bandpass filters are critical components in high-frequency communication systems.
  • Micromachining offers potential for miniaturized and high-performance RF components.

Purpose of the Study:

  • To investigate the fabrication accuracy of W-band SU-8 micromachined waveguide bandpass filters.
  • To assess the suitability of SU-8 for creating high-precision, layered RF structures.
  • To analyze the challenges and propose solutions for SU-8 micromachining of filters.

Main Methods:

  • Design of a 4th order waveguide bandpass filter using cylindrical resonators excited in TM010 mode.
  • Fabrication using a layered SU-8 micromachining process with silver coating.
  • Characterization of manufacturing tolerances including thickness, stacking, and angle deviation.
  • Electromagnetic simulation and experimental measurement of filter performance.
  • Stress and deformation analysis for structural integrity.

Main Results:

  • Excellent manufacturing tolerances achieved: ±4 μm in thickness, ±10 μm in stacking accuracy, and ±1° in vertical angle deviation.
  • Measured return loss of 12.4 dB and minimum insertion loss of 0.8 dB, consistent with simulations.
  • Identified challenges in SU-8 processing with proposed general solutions for high-precision devices.
  • Stress analysis confirmed the filter's ability to withstand pressure while maintaining performance.

Conclusions:

  • The SU-8 micromachining process enables high-accuracy fabrication of W-band waveguide bandpass filters.
  • The proposed fabrication method and solutions address key challenges in SU-8 processing for RF applications.
  • The demonstrated performance validates SU-8 as a suitable material for advanced microwave component manufacturing.