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    We developed a novel polysilicon overlay technique to boost waveguide grating coupler efficiency. This method enhances mode matching and directionality, achieving high-performance perfectly vertical grating couplers.

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    Area of Science:

    • Photonics and Optical Engineering
    • Nanotechnology
    • Materials Science

    Background:

    • Waveguide grating couplers are essential for integrated photonics.
    • Improving coupling efficiency and directionality is a key challenge.
    • Existing methods often face limitations in performance and fabrication.

    Purpose of the Study:

    • To introduce and validate a new approach for enhancing waveguide grating coupler efficiency.
    • To design a high-efficiency perfectly vertical grating coupler (PVGC).
    • To leverage composite subwavelength structures for improved optical performance.

    Main Methods:

    • Optimizing shift-patterned polysilicon overlay on a silicon grating structure.
    • Tuning positional shifts and duty cycles of overlay and grating periods.
    • Fabrication using photolithography via a commercial multi-project wafer service.

    Main Results:

    • Achieved a simulated coupling efficiency of -0.91 dB for a perfectly vertical grating coupler (PVGC).
    • Demonstrated improved mode matching and directionality through composite subwavelength structures.
    • Measured a coupling loss of approximately 1.45 dB in fabricated devices.

    Conclusions:

    • The proposed shift-patterned polysilicon overlay significantly enhances grating coupler performance.
    • This technique enables the design of efficient and perfectly vertical grating couplers.
    • The method is compatible with standard fabrication processes, offering practical advantages.