Photo-Curable Lacquer Sap Resin Based on Urushiol-Mimicking, Tyrosine-Containing Additive

Jiwon Park1, Seon-Mi Jin1, Avnish Kumar Mishra1

  • 1School of Materials Science and Engineering, Gwangju Institute of Science and Technology (GIST), Gwangju 61005, Republic of Korea.

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