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Updated: Aug 30, 2025

Preparation of Silicon Nanowire Field-effect Transistor for Chemical and Biosensing Applications
Published on: April 21, 2016
Comparative Characterization of NWFET and FinFET Transistor Structures Using TCAD Modeling
Konstantin O Petrosyants1,2, Denis S Silkin1, Dmitriy A Popov3
1School of Electronic Engineering, HSE University, 34 Tallinskaya St., 123458 Moscow, Russia.
Abstract:
A complete comparison for 14 nm FinFET and NWFET with stacked nanowires was carried out. The electrical and thermal performances in two device structures were analyzed based on TCAD simulation results. The electro-thermal TCAD models were calibrated to data measured on 30-7 nm FinFETs and NWFETs. The full set of output electrical device parameters I, I, SS, V, and maximal device temperature Tmax was discussed to achieve the optimum VLSI characteristics.
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