Fabrication of Nanostructures on a Large-Area Substrate with a Minimized Stitch Error Using the Step-and-Repeat

Yeonjoo Ha1,2, Hyungjun Lim1,2, Hak-Jong Choi1

  • 1Korea Institute of Machinery and Materials, 156, Gajeongbuk-ro, Yuseong-gu, Daejeon 34103, Korea.

Summary

Researchers developed step-and-repeat nanoimprint lithography (NIL) to create large nanostructured substrates from small stamps. This method overcomes limitations of conventional NIL for mass production of nano-devices.

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