Breaking the symmetry of nanosphere lithography with anisotropic plasma etching induced by temperature gradients

Daniel Darvill1, Marzia Iarossi1,2, Ricardo M Abraham Ekeroth1,3

  • 1Istituto Italiano di Tecnologia Via Morego 30 16136 Genova Italy Francesco.DeAngelis@iit.it.

Nanoscale Advances
|September 22, 2022
PubMed

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