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The Modulation of Electrokinetic Streaming Potentials of Silicon-Based Surfaces through Plasma-Based Surface
Li Cheng, Bei Fan1, Zichen Zhang
1Department of Mechanical Engineering, Michigan State University, East Lansing, Michigan 48824, United States.
Langmuir : the ACS Journal of Surfaces and Colloids
|September 23, 2022
Summary
Plasma processing enhances streaming potential (Vs) in microchannels by modifying surface properties. This method achieved a record Vs, paving the way for new microfluidic voltage sources.
Area of Science:
- Surface science
- Microfluidics
- Plasma physics
Background:
- Electrokinetic flows generate streaming potential (Vs) in microchannels.
- Surface properties like zeta potential and slip length significantly influence Vs.
- Optimizing these properties is crucial for efficient microfluidic energy harvesting.
Purpose of the Study:
- To develop a plasma processing method for enhancing Vs in silicon microchannels.
- To investigate the impact of plasma parameters on zeta potential and slip length.
- To achieve record Vs values for microfluidic applications.
Main Methods:
- Utilized CF4 and Ar plasma treatments on silicon microchannels.
- Varied plasma parameters including pressure, exposure time, and power.
- Measured streaming potential (Vs) and analyzed surface zeta potential and electrolyte slip length.
Main Results:
- Plasma processing significantly enhanced the streaming potential (Vs).
- CF4 plasma treatment increased zeta potential while potentially decreasing slip length.
- A record Vs of ~0.1 mV/Pa was achieved with optimized CF4 plasma conditions.
Conclusions:
- Plasma processing offers a viable method for boosting Vs in microfluidic devices.
- Tailoring surface properties via plasma treatment can optimize electrokinetic energy generation.
- The findings support the development of novel microfluidic voltage sources.
