The effect of simulated insertion depth differences on the vocal pitches of cochlear implant users

Simin Soleimanifar1, Hannah E Staisloff1, Justin M Aronoff1

  • 1Speech and Hearing Science Department, University of Illinois at Urbana-Champaign, 901 South 6th Street, Champaign, Illinois 61801, USA simins2@illinois.edu, hestaisloff@gmail.com, jaronoff@illinois.edu.

JASA Express Letters
|September 26, 2022
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