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Updated: Aug 27, 2025

Atomically Defined Templates for Epitaxial Growth of Complex Oxide Thin Films
Published on: December 4, 2014
Christian P Canlas1, Lei Cheng2, Brandon O'Neill3
1Applied Materials Division, Argonne National Laboratory, 9700 South Cass Avenue, Lemont, Illinois 60439, United States.
Atomic layer deposition (ALD) enables precise tuning of Brønsted and Lewis acid sites in solid acid catalysts. This advancement offers new possibilities for biomass conversion, overcoming limitations of traditional zeolites and amorphous silica-aluminas.
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