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Updated: Aug 27, 2025

Ohmic Contact Fabrication Using a Focused-ion Beam Technique and Electrical Characterization for Layer Semiconductor Nanostructures
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Ohmic Contact Fabrication Using a Focused-ion Beam Technique and Electrical Characterization for Layer Semiconductor Nanostructures

Published on: December 5, 2015

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First principles study on thickness dependent structural and electronic properties unveiling the growth and stability

P Devi1, D Mahendiran1,2, P Murugan1,2

  • 1Electrochemical Power Sources Division, CSIR Central Electrochemical Research Institute, Karaikudi-630003, Tamil Nadu, India. murugan@cecri.res.in.

Physical Chemistry Chemical Physics : PCCP
|September 29, 2022
PubMed

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