Simultaneous Writing and Erasing Using Probe Lithography Synchronized Erasing and Deposition (PLiSED).

Area of Science:

• Materials Science
• Nanotechnology
• Surface Chemistry

Background:

• Microscale pattern fabrication is crucial for advanced materials and devices.
• Existing lithography techniques often involve multiple steps and can be time-consuming.
• A need exists for efficient, single-step methods for modifying surfaces at the microscale.

Purpose of the Study:

• To demonstrate simultaneous writing and erasing of multiple molecules in a single step using Polymeric Lithography Editor (PLE) probes.
• To investigate the efficiency, speed, and influencing factors of this novel molecular editing process.
• To explore the potential applications of this technique in microscale pattern fabrication and surface modification.

Main Methods:

• Utilized nanoporous Polymeric Lithography Editor (PLE) probes loaded with specific molecules (rhodamine B, fluorescein).
• Rastered the probe over a substrate coated with another molecule (quinine) to achieve simultaneous erasure and deposition.
• Employed atomic force microscopy to characterize probe properties (Young's modulus) and optimize editing conditions (relative humidity, erasing time).

Main Results:

• Achieved simultaneous writing and erasing of two and three molecules in one step, a process termed PLiSED.
• Demonstrated high erasing efficiency (>95%) and deposition of molecules at speeds up to 10,000 μm²/s.
• Identified the necessity of a transport medium for molecular exchange and the influence of probe mechanical properties on editing efficiency.

Conclusions:

• PLiSED offers a significant improvement in efficiency and accuracy for microscale lithographic editing.
• The technique enables rapid on-site lithographic rectification and has broad applications in high-quality lithography and surface modification.
• Control over probe properties and experimental conditions is key to achieving high-quality microscale patterns.