Atomic layer deposition of Zr-sandwiched ZnO thin films for transparent thermoelectrics
Tomi Koskinen1, Ulrika Volin1, Camilla Tossi1,2
1Department of Electronics and Nanoengineering, Aalto University, PO Box FI-13500, Finland.
Abstract:
Atomic layer deposited (ALD) transparent thermoelectric materials enable the introduction of energy harvesting and sensing devices onto surfaces of various shapes and sizes in imperceptible manner. Amongst these materials, ZnO has shown promising results in terms of both thermoelectric and optical characteristics. The thermoelectric performance of ZnO can be further optimized by introducing extrinsic doping, to the realization of which ALD provides excellent control. Here, we explore the effects of sandwiching of ZrO2layers with ZnO on glass substrates. The room-temperature thermoelectric power factor is maximised at 116μW m-1K-2with samples containing a 2% nominal percentage of ZrO2. The addition of ZrO2layers is further shown to reduce the thermal conductivity, resulting in a 20.2% decrease from the undoped ZnO at 2% doping. Our results contribute to increasing the understanding of the effects of Zr inclusion in structural properties and growth of ALD ZnO, as well as the thermal and thermoelectric properties of Zr-doped ZnO films in general.


