Special Issue "ALD Technique for Functional Coatings of Nanostructured Materials"
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Updated: Aug 25, 2025
Fabrication of Gradient Nanopattern by Thermal Nanoimprinting Technique and Screening of the Response of Human Endothelial Colony-forming Cells
Published on: July 1, 2018
Javier Garcia Fernández1, Victor Vega Martínez2, Victor Manuel de la Prida Pidal1
1Departamento de Física, Facultad de Ciencias, Universidad de Oviedo, C/Federico García Lorca nº 18, 33007 Oviedo, Spain.
Abstract:
Atomic layer deposition (ALD) is a vapor-phase technique that consists of the alternation of separated self-limiting surface reactions, which enable film thickness to be accurately controlled at the angstrom level, based on the former atomic layer epitaxy method [...].
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