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Updated: Aug 25, 2025
Fabrication of Gradient Nanopattern by Thermal Nanoimprinting Technique and Screening of the Response of Human Endothelial Colony-forming Cells
Published on: July 1, 2018
Special Issue "ALD Technique for Functional Coatings of Nanostructured Materials"
Javier Garcia Fernández1, Victor Vega Martínez2, Victor Manuel de la Prida Pidal1
1Departamento de Física, Facultad de Ciencias, Universidad de Oviedo, C/Federico García Lorca nº 18, 33007 Oviedo, Spain.
Abstract:
Atomic layer deposition (ALD) is a vapor-phase technique that consists of the alternation of separated self-limiting surface reactions, which enable film thickness to be accurately controlled at the angstrom level, based on the former atomic layer epitaxy method [...].
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