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Hardware optical correlation method for dynamic detection of micrometer gaps with sub-nanometer resolution.

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    Area of Science:

    • Optics and Photonics
    • Nanotechnology
    • Metrology

    Background:

    • Surface plasmon lithography offers sub-wavelength resolution by overcoming the diffraction limit.
    • Accurate control of the mask-substrate working distance is critical for high-quality lithography.
    • Existing methods lack the precision required for dynamic gap sensing in nanolithography.

    Purpose of the Study:

    • To analyze the mask-substrate gap sensing mechanism for surface plasmon lithography.
    • To develop a high-resolution absolute distance measurement model for the mask-substrate gap.
    • To implement a dynamic gap detection system with sub-nanometer precision.

    Main Methods:

    • Established a mask-substrate gap absolute distance measurement model using white light interference.
    • Designed a Fizeau interferometer demodulation system employing a hardware optical correlation method.
    • Utilized singular spectrum analysis (SSA) for dynamic gap value extraction and data processing.

    Main Results:

    • Demonstrated a gap detection range of 3.0 to 6.0 µm.
    • Achieved high stability of ±0.12 nm in gap measurement.
    • Obtained a resolution better than 0.30 nm for dynamic gap detection.

    Conclusions:

    • The developed Fizeau interferometer system effectively measures and controls the mask-substrate gap in surface plasmon lithography.
    • The combination of white light interference, optical correlation, and SSA provides sub-nanometer resolution and high stability.
    • This technology is crucial for advancing high-resolution nanolithography techniques.