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Solvent-Responsive Invisible Photonic Patterns with High Contrast for Fluorescence Emission Regulation and
Peng Ren1, Xiaodong Chen1, Luetao Sun1
1State Key Laboratory of Materials Processing and Die & Mould Technology and Key Laboratory of Material Chemistry for Energy Conversion & Storage of Ministry of Education (HUST), School of Chemistry & Chemical Engineering, Huazhong University of Science and Technology (HUST), Wuhan430074, China.
Abstract:
Invisible photonic patterns (IPPs) are photonic materials that can display hidden patterns under external stimulation and are attractive in anti-counterfeiting devices and information storage. In this work, we report a solvent-responsive invisible photonic pattern (SRIPP) with high contrast by polymerizing two monomers of acrylamide (AAm) and poly(ethylene glycol) methacrylate (PEGMA) with different solubility parameters in different regions of poly(hydroxyethyl methacrylate) photonic gels. The two regions with different solvent responsiveness can shrink and swell in the same environment, thus causing the colors of different regions of photonic gel to shift in opposite directions from the initial state. As a result, the contrast of photonic patterns is significantly improved, increasing naked-eye visualization. In addition, by introducing fluorescent substances into the photonic gel and adjusting the photonic band gap (PBG) of photonic gels, we realize the regulation of fluorescence emission and display of fluorescence patterns by utilizing different PBGs on the SRIPP. Dynamic solvent responsiveness patterns and fluorescence patterns are integrated into a photonic gel, showing great potential in information storage and multiple-mode anti-counterfeiting applications.
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