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Related Concept Videos

Inductively Coupled Plasma Atomic Emission Spectroscopy: Principle01:19

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Inductively coupled plasma (ICP) is the most widely used plasma source in atomic emission spectroscopy (AES), also known as Inductively Coupled Plasma Optical Emission Spectroscopy (ICP-OES). The ICP source, or torch, consists of three concentric quartz tubes with argon gas flowing through them. A spark from a Tesla coil initiates the ionization of argon, generating a high-temperature plasma.
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In inductively coupled plasma–mass spectrometry (ICP–MS), an inductively coupled plasma (ICP) torch is used as an atomizer and ionizer. Solid samples are dissolved and volatilized before being introduced into the high-temperature argon plasma, while solution samples are nebulized and passed through the high-temperature argon plasma. Plasma dissociates the analytes and ionizes their component atoms to form a mixture of positive ions and molecular species. The positive ions are then...
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Large area multi-filamentary plasma source for large volume plasma device-upgrade.

A K Sanyasi1, P K Srivastava1, Ayan Adhikari1

  • 1Institute for Plasma Research, Bhat, Gandhinagar 382428, India.

The Review of Scientific Instruments
|November 1, 2022
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Summary

The new Large Area Multi-Filamentary Plasma Source (LAMPS) offers a large, uniform plasma with low electron temperature. It shows advantages over other sources for large-volume plasma generation.

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Area of Science:

  • Plasma Physics
  • Materials Science
  • Engineering

Background:

  • Large-volume plasma generation is crucial for various industrial and research applications.
  • Existing plasma sources often face limitations in scalability, uniformity, and operational efficiency for large volumes.

Purpose of the Study:

  • To characterize the performance of the newly installed Large Area Multi-Filamentary Plasma Source (LAMPS).
  • To evaluate its suitability for generating large-volume, uniform plasmas with specific electron density and temperature parameters.

Main Methods:

  • Directly heated hairpin-shaped tungsten filaments (0.5 mm diameter) operated at 2700 K.
  • Biasing LAMPS with a negative discharge voltage to emit energetic electrons.
  • Pulsed argon plasma generation with a 50 ms duration.

Main Results:

  • Achieved plasma electron density of ~2x10^17 m^-3 with 0.5 mm filaments.
  • Demonstrated good radial uniformity (Ln = 210 cm) and axial uniformity.
  • Projected plasma density of ~10^18 m^-3 with thicker filaments (0.75-1.0 mm).

Conclusions:

  • LAMPS is a promising laboratory plasma source with advantages in operational life, handling, and high-pressure compatibility.
  • It offers superior performance for producing plasma over large cross sections and fill volumes compared to contemporary sources.
  • Further optimization with thicker filaments can achieve the target plasma density of ~10^18 m^-3.