Electrochromic Displays via the Room-Temperature Electrochemical Oxidation of Nickel

Electrochromism refers to the persistent and reversible change in color by applying an electric field. The phenomenon involves the insertion and extraction of electrons and ions within the active material. There is a keen interest in electrochromic (EC) materials, since they exhibit a wide range of potential applications. In recent years, transition-metal oxides have been widely investigated as EC materials due to their low power requirement, high coloration efficiency, and memory effect under an open-circuit condition. Nickel oxide (NiO), a p-type wide band gap semiconductor, exhibits attractive features such as a high color contrast ratio, good chemical stability, cost-effectiveness, and good compatibility with the cathodically coloring tungsten oxide. NiO thin films have been fabricated by various methods, but these are not cost-effective, scalable, or suitable for flexible applications. With the increasing demand for flexible and soft EC devices, it is essential to find routes to fabricate NiO thin films at lower temperatures. In this work, a NiO/Ni(OH)₂-based thin EC layer on fluorine-doped tin oxide-coated glass is developed via an electroless nickel (EN) deposition route, followed by room-temperature electrochemical oxidation. The deposition time is optimized to control the film thickness. The EC performance is investigated in an aqueous alkaline electrolyte (1 M KOH) by means of cyclic voltammetry, chronoamperometry, and transmittance measurements. Both the as-deposited and annealed films, after electrochemical oxidation, exhibit excellent EC properties with an optical modulation of approximately 64% (at 550 nm) and good response times of approximately 3 s (coloration) and 14 s (bleaching). A 2 × 2 display obtained by patterning the EN deposition is also demonstrated as part of this work.