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Influence of Additive N2 on O2 Plasma Ashing Process in Inductively Coupled Plasma

Ye-Bin You1, Young-Seok Lee1, Si-Jun Kim1

  • 1Department of Physics, Chungnam National University, Daejeon 34134, Korea.

Nanomaterials (Basel, Switzerland)
|November 11, 2022
PubMed

Keywords:
EEPFLangmuir probeoptical emission spectroscopyoxygen radical densityplasma ashing

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