The Thermal Dissociation-Recombination Reactions of SiF₄, SiF₃, and SiF₂: A Shock Wave and Theoretical Modeling Study

Monitoring UV absorption signals of SiF₂ and SiF, the thermal dissociation reactions of SiF₄ and SiF₂ were studied in shock waves. Rationalizing the experimental observations by standard unimolecular rate theory in combination with quantum-chemical calculations of the reaction potentials, rate constants for the thermal dissociation reactions of SiF₄, SiF₃, and SiF₂ and their reverse recombination reactions were determined over broad temperature and pressure ranges. A comparison of fluorosilicon and fluorocarbon chemistry was finally made.