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Updated: Aug 20, 2025

Fabrication of Low Temperature Carbon Nanotube Vertical Interconnects Compatible with Semiconductor Technology
Published on: December 7, 2015
Complementary Transistors Based on Aligned Semiconducting Carbon Nanotube Arrays.
Chenchen Liu1,2, Yu Cao1, Bo Wang3
1Key Laboratory for the Physics and Chemistry of Nanodevices and Center for Carbon-based Electronics, School of Electronics, Peking University, Beijing 100871, China.
Researchers developed high-performance N-type field-effect transistors (N-FETs) using aligned carbon nanotubes (A-CNTs), overcoming previous limitations. This breakthrough enables complementary metal-oxide-semiconductor (CMOS) technology for advanced digital integrated circuits (ICs).
Area of Science:
- Materials Science
- Nanotechnology
- Electrical Engineering
Background:
- High-density aligned carbon nanotube (A-CNT) arrays show promise for digital integrated circuits (ICs).
- Previous research focused on P-type field-effect transistors (P-FETs), with high-performance N-type FETs (N-FETs) remaining a challenge.
- The absence of high-performance A-CNT N-FETs hinders the development of complementary metal-oxide-semiconductor (CMOS) technology.
Purpose of the Study:
- To identify the mechanism limiting A-CNT N-FET performance with low-work-function metal contacts.
- To develop solutions for enhancing A-CNT N-FET performance to match P-FETs.
- To demonstrate scalable A-CNT CMOS technology for digital IC applications.
Main Methods:
- Investigated the hindering mechanism in A-CNT N-FETs contacted by low-work-function metals.
- Fabricated scandium (Sc)-contacted A-CNT N-FETs with a 100 nm gate length.
- Developed and tested A-CNT CMOS technology integrating both N-FETs and P-FETs.
Main Results:
- Achieved record performance for A-CNT N-FETs with an on-state current (Ion) of 800 μA/μm and transconductance (gm) of 250 μS/μm.
- Demonstrated symmetric high performance in fabricated A-CNT CMOS FETs.
- Observed electron and hole mobilities of 325 and 241 cm2 V-1 s-1, respectively, exceeding those of silicon CMOS transistors.
Conclusions:
- Overcame limitations in A-CNT N-FET fabrication, enabling high-performance devices.
- Successfully developed scalable A-CNT CMOS technology with performance comparable to silicon.
- This advancement paves the way for A-CNT-based electronics in next-generation digital ICs.
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