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Updated: Aug 19, 2025

Growth and Electrostatic/chemical Properties of Metal/LaAlO3/SrTiO3 Heterostructures
Published on: February 8, 2018
(Cr1-xAlx)N Coating Deposition by Short-Pulse High-Power Dual Magnetron Sputtering
Alexander Grenadyorov1, Vladimir Oskirko1, Alexander Zakharov1
1The Institute of High Current Electronics SB RAS, 2/3, Akademichesky Ave., 634055 Tomsk, Russia.
Abstract:
The paper deals with the (Cr1-xAlx)N coating containing 17 to 54 % Al which is deposited on AISI 430 stainless steel stationary substrates by short-pulse high-power dual magnetron sputtering of Al and Cr targets. The Al/Cr ratio in the coating depends on the substrate position relative to magnetrons. It is shown that the higher Al content in the (Cr1-xAlx)N coating improves its hardness from 17 to 28 GPa. Regardless of the Al content, the (Cr1-xAlx)N coating manifests a low wear rate, namely (4.1-7.8) × 10-9 and (3.9-5.3) × 10-7 mm3N-1m-1 in using metallic (100Cr6) and ceramic (Al2O3) counter bodies, respectively. In addition, this coating possesses the friction coefficient 0.4-0.7 and adhesive strength quality HF1 and HF2 indicating good interfacial adhesion according to the Daimler-Benz Rockwell-C adhesion test.
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