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Atomic Force Microscopy01:08

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Extreme ultraviolet (EUV) radiation offers a novel approach for atom probe tomography, enabling enhanced material analysis. This study demonstrates the first EUV radiation-pulsed atom probe microscope, showcasing its potential for advanced materials characterization.

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Area of Science:

  • Materials Science
  • Surface Science
  • Analytical Chemistry

Background:

  • Atom probe tomography (APT) traditionally uses near-ultraviolet (NUV) wavelengths.
  • NUV radiation has limitations in sample absorption and ionization pathways.
  • A need exists for advanced APT techniques with broader applicability and enhanced sensitivity.

Purpose of the Study:

  • To introduce and demonstrate the world's first extreme ultraviolet (EUV) radiation-pulsed atom probe microscope.
  • To investigate the potential of EUV radiation for athermal field ion emission in APT.
  • To assess the performance of EUV-APT on diverse material types.

Main Methods:

  • Development of a femtosecond-pulsed, coherent EUV radiation source.
  • Integration of the EUV source with a local electrode atom probe tomograph via a vacuum manifold beamline.
  • Demonstration of EUV photon-assisted field ion emission on insulating, semiconducting, and metallic specimens.

Main Results:

  • Successful implementation of the first EUV radiation-pulsed atom probe microscope.
  • Demonstration of EUV photon-assisted field ion emission across various material classes.
  • High absorption of EUV radiation within the initial nanometers of sample surfaces.

Conclusions:

  • EUV radiation is a promising alternative to NUV for APT, offering superior absorption and novel ionization mechanisms.
  • The developed EUV-APT system shows potential for analyzing a wide range of materials.
  • Further research is warranted to fully explore the capabilities of EUV-APT for advanced materials analysis.