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Charge Transport inside TiO2 Memristors Prepared via FEBID
Markus Baranowski1, Roland Sachser1, Bratislav P Marinković2
1Physikalisches Institut, Goethe University, 60438 Frankfurt am Main, Germany.
Abstract:
We fabricated memristive devices using focused electron beam-induced deposition (FEBID) as a direct-writing technique employing a Pt/TiO2/Pt sandwich layer device configuration. Pinching in the measured current-voltage characteristics (i-v), the characteristic fingerprint of memristive behavior was clearly observed. The temperature dependence was measured for both high and low resistive states in the range from 290 K down to about 2 K, showing a stretched exponential behavior characteristic of Mott-type variable-range hopping. From this observation, a valence change mechanism of the charge transport inside the TiO2 layer can be deduced.
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